NvA-IW300 Series In-Line Wafer Ionic Contamination Monitoring System

Product Information

NvA-IW300 is a world first in-line wafer ionic non-visual defect detection system to prevent yield drop or wafer scraps by ionic contamination in the semiconductor manufacturing Fabs.

It is a standalone and fully automated system with a built-in wafer scan system and an  integrated IC. And it supports FA and Host communication and it has its own auto calibration function and safety features for the in-line use not only Q-Labs application.

  • ㆍFull Automatic Wafer handling, wafer scanning, sample preparation and IC Analysis
    ㆍIC integrated for IN-LINE application
    ㆍSafety Design
    ㆍFactory Automation and Host communication Support
    ㆍNo harmful Gas/Chemical is used.
  • ㆍDetection limit : 1 ppb (1.0E10 atoms/cm^2)
    ㆍThroughput : 2 WPH
    ㆍIonic residues on the wafer surface : F-, Cl-, Br-, NO2-, NO3-, SO42-, PO43-, ClO2-, BrO3-, ClO3-, CO32-, C2O42-, HCOO-, C3H5O2-, NH4+
    ㆍDetector : IC (Ion Chromatography)
  • ㆍMonitoring of residual etch source gases on the wafers after Etch process. - CF etchant (CF4, CHF3, C4F6, etc), SiF4, Cl2, HBr, NO2, NO3
    ㆍMonitoring of Ionic Residuals on the wafers after Clean process - NO2, NO3, SO4, F, NH3, etc.
    ㆍMonitoring of residuals on the wafer after metal deposition process – TiCl4, WF6, Cl, F.