As the device node enters into 20nm era, the effect of non-visual defects, such as metallic and non-metallic contamination,
on the device performance is getting more and more significant and cannot be neglected anymore.
And the non-visual defect control will be crucial to yield management of under 20nm devices.
Our M-SPEC, O-SPEC and I-SPEC provides you with total solution of metallic, organic and ionic contamination monitoring for gases,
chemicals and wafers in the semiconductor ecosystem, respectively.